Coated substrate with high reflectance

ABSTRACT

A transparent coated substrate with rather high reflectance, especially for use as in exterior glazing panels for buildings or automotives, is provided by a substrate carrying a coating stack comprising a pyrolytically-formed main layer containing oxide of tin and an outer layer comprising TiO 2 , whereby the so-coated substrate has a reflectance (RL) of more than 10%. The coated substrate advantageously shows photocatalytic and hydrophilic properties.

The present invention relates to a coated substrate with relatively highreflectance and photocatalytic properties. It is especially concernedwith transparent glass substrates bearing a coating comprising a mainlayer of oxides of tin, (eventually doped with antimony and/or fluorine)and an outer layer mainly of titanium oxide and with the use of suchsubstrates in exterior glazing panels for buildings or for theautomotive industry.

Although architects seeking glazing panels for use in buildings havetraditionally tended to favour panels with low levels of reflection, achanging perception of the aesthetic appeal has led to increasingdemands for panels with higher levels of reflection but without theglare as viewed from outside which is associated with very high levelsof reflection. The panels may also be required to have other qualitiessuch as providing protection for occupants of the building against solarradiation and the associated overheating (solar screening properties).

There is also increasing search to provide glazing with additionalfunctions such as self-cleaning properties and hydrophilic properties.Some materials called “photocatalytic” and based on particular metaloxides are known for their ability to degrade contamination uponexciting radiations, in particular UV radiations.

The panels comprise at least one sheet of a transparent substratematerial, typically soda-lime glass, with a thin coating on one or moreof the sheet faces to modify, amongst other, the opto-energetic andphysico-chemical properties of the sheet and the panel as a whole. Ahuge variety of prior proposals have been made for the coating,according to the specific properties sought. The coating may comprise astack of several discrete layers chosen with appropriate compositionsand thicknesses to complement their respective effects. A persistentproblem in choosing the respective layers is that a layer adopted forone purpose may adversely change the effect of other layers.

Tin oxide (SnO₂) has been widely used as a coating material, often incombination with other metal oxides. Coatings comprising tin oxide witha small proportion of antimony oxide have proved especially attractivefor anti-solar purposes.

Our GB patent 1455148 teaches a method for pyrolytically forming acoating of one or more oxides (e.g. ZrO₂, SnO₂, Sb₂O₃, TiO₂, Co₃O₄,Cr₂O₃, SiO₂) on a substrate, primarily by spraying compounds of a metalor silicon, so as to modify the light transmission and/or lightreflection of the substrate. Our GB patent 2078213, which relates to amethod for pyrolytically forming a coating by two separate sprays toachieve high rates of coating build-up, discloses tin oxide coatingsdoped with fluorine or antimony. Our GB patent 2200139 relates toforming a pyrolytic tin oxide coating from a precursor containing atleast two additives such as oxidising agents, sources of fluorine andsources of metal.

The use of a tin oxide coating with a small proportion of antimony oxidehas been found to offer several advantageous combinations of optical andenergy properties. Our GB patent applications 2302101 ('101) and 2302102('102) describe anti-solar glazing panels comprising a pyrolytic coatinglayer of oxides of tin and antimony in which the Sb/Sn molar ratio isfrom 0.01 to 0.5. The '101 coating is applied by liquid spray and has athickness of at least 400 nm, a luminous transmittance of less than 35%and a selectivity of at least 1.3. The '102 coating is applied bychemical vapour deposition (CVD) and has a solar factor below 70%.

The use of pyrolysis to form a coating on a substrate generally has theadvantage of producing a hard coating with durable abrasion-resistantand corrosion-resistant properties. It is believed that this is due inparticular to the fact the process involves deposition of coatingmaterial on to a substrate which is hot. Pyrolysis is also generallycheaper than alternative coating processes such as sputtering,particularly in terms of the investment in plant.

Properties of the coated substrate discussed herein are based on thestandard definitions of the International Commission onIllumination—Commission Internationale de l'Eclairage (“CIE”). Theilluminant for the tests was illuminant C, which represents averagedaylight having a colour temperature of 6700 K and is especially usefulfor evaluating the optical properties of glass intended for use inbuildings.

The “luminous transmittance” (TL) is the luminous flux transmittedthrough a substrate as a percentage of the incident luminous flux.

The “luminous reflectance” (RL) is the luminous flux reflected from asubstrate as a percentage of the incident luminous flux.

The “purity” (p) of the colour of the substrate refers to the excitationpurity in transmission or reflection.

The “dominant wavelength” (λ_(D)) is the peak wavelength in thetransmitted or reflected range.

The “solar factor” (FS), referring to the transmission of total incidentsolar radiation through the coated substrate, is the sum of the totalenergy directly transmitted (TE) and the energy which is absorbed andre-radiated on the side of the coated substrate away from the energysource, as a proportion of the total incident radiant energy.

The “selectivity” of a coated substrate for use in a building glazingpanel is the ratio of the luminous transmittance to the solar factor(TL/FS).

It is an object of the present invention to provide a pyrolyticallyformed coating on a substrate to impart self-cleaning propertiespossibly combined with solar screening properties and a relatively highreflectance to the substrate.

We have discovered that this and other useful objectives can be achievedby depositing a coating stack comprising a defined overcoat layer on amain layer comprising mainly tin oxide.

According to the invention there is provided a transparent substratecarrying a coating stack comprising a pyrolytically-formed main layercontaining oxides of tin possibly doped with antimony and/or fluorine,characterised in that the stack includes an outer layer comprisingtitanium oxide and having a refractive index in the range 2.0 to 2.8,whereby the so-coated substrate has a reflectance (RL) of more than 10%.

The presence of the outer layer creates an increase of the luminousreflectance (RL) of the coated substrate, increasing the reflectancefrom the coated side, from less than 10% to more than 10%. According tothe present invention, the claimed substrate advantageously has areflectance greater than 14% but lower than 30%, and preferably lowerthan 25%. Moreover these increases are achieved without taking the otheroptical properties of the substrate beyond acceptable limits. The outerlayer is also beneficial in further improving the abrasion and corrosionresistance of the coating.

Furthermore, it has been discovered that the presence of the TiO₂ outerlayer according to the invention induces photocatalytic properties tothe coated surface. In particular, the photocatalytic activity isgreater than 2.10⁻³ cm⁻¹ min⁻¹ and preferably greater than 5.10⁻³ cm⁻¹min⁻¹. One of the more common method for measuring this activity isbased on the degradation of stearic acid. According to this method, thesamples are dipped in a solution of stearic acid in methylic alcohol atroom temperature. Then the samples are irradiated by ultravioletradiations of a frequency of 340 nm in a “QUV Accelerated WeatherinTester” for 5 minutes with a power of 40 watt/m² with lamps of the typeUVA 340. The FTIR (Fourrier Transform Infrared Spectrophotometer)spectra are obtained every 5 minutes until cumulative time reaches 20minutes. The slope of the linear regression of the curve “integratedintensity versus UV irradiation time” gives the photocatalytic activity.

It has also been discovered that the presence of the TiO2 layeraccording to the invention induces hydrophilic properties after UVirradiations. In particular the contact angle with water after 3 hoursof irradiation at the temperature of 40° C. in a “QUV AcceleratedWeathering Tester” with lamps of the type UVA 340, is lower than 10°,preferably lower than 5°.

Although the invention is described herein primarily with reference toglazing panels for buildings, panels according to the invention aresuitable for other applications such as vehicle windows, in particularvehicle sunroofs.

According to some embodiment of the present invention, the outer layermay contain, in addition to the titanium oxide, an oxide of one or moreof nickel, tin, zinc and zirconium.

It has been discovered that when the outer coating contains oxide oftitanium together with oxide of tin, this confers to the coating abetter abrasion and chemical resistance. Such enhancement of theabrasion and chemical resistance is principally important when thecoating is applied by liquid pyrolisis. Such a coating contains mostpreferably at least 50% by volume of tin oxide and at least 30% byvolume of titanium oxide.

The preferred geometric thickness for the outer coating is in the rangeof 10 to 350 nm. The preferred geometric thickness for tin/titaniumoxide reflective layer is in the range 40 to 75 nm. If a low RL iswished, for example lower than 20%, it has been discovered that someranges of thickness are preferable: between 10 and 25 nm, between 90 and140 nm and between 200 and 300 nm.

In fact, the thickness of each layer has to be chosen in order to obtainthe required optical stability. Optical stability means that variationsof the thickness of the layer, inherent in industrial production, do notcause significant changes of the optical properties, particularly ofHunter values a and b and purity in reflection.

Advantageously, the claimed coated substrate has neutral tint inreflection. In particular, a good neutral tint is achieved when theHunter values a and b are comprised between −20 and 5, more preferablybetween −10 and 0.

When the main layer comprises a Sb/Sn oxide material, good anti-solarproperties are further imparted to the coated substrate. The geometricthickness of at least 250 nm for this layer represents an optimum rangefor a layer in terms of providing solar screening properties soughtafter and a neutral tint. Preferably the said thickness is lower than650 nm, for economic and practical reasons. Most preferably, thethickness is in the range 40 to 500 nm, still more preferably in therange 260 to 360 nm and still more preferably between 300 to 330 nm.Such a range permits, in particular, the attainment of coated productswith sufficient solar screening properties and presenting opticalstability.

Purity in reflection is preferably low, i.e. less than 20%, preferablyless than 10%.

As taught in our earlier patent specification GB-A-2302102, when themain layer comprises oxides of tin and antimony, the Sb/Sn molar ratiois preferably in the range 0.01 to 0.5, more preferably in the range0.03 to 0.21.

As described and claimed in our copending patent application of the samedate as the present parent application, when the reflectance of thecoated substrate is desired rather high, the main coating layer maycontains an additive comprising one or more of aluminum, chromium,cobalt, iron, manganese, magnesium, nickel, titanium, vanadium, zinc andzirconium. The said additive is preferably selected from chromium, ironand magnesium.

The main coating layer may also comprise SnO2 doped with fluorine inplace of the main layer described above or in addition to this mainlayer. In this case low emissivity properties may be obtained inaddition to the self-cleaning properties.

In one embodiment of the invention the coating stack further comprisesan undercoat positioned between the substrate and the main coatinglayer. The undercoat serves to improve the aesthetic appeal of thecoating both by reducing or eliminating haze in the coating stack and byneutralising the colour that the tin oxide in the main layer tends toimpart to the stack.

Suitable materials for the undercoat include one or more silicon oxideor alumina-based coating, for example alumina with a small proportion ofvanadium oxide, or aluminum oxinitride. In the case of silicon oxides itis preferred to use an incompletely oxidised material, i.e. SiO_(x)where x is less than 2, which may have the general structure of SiO₂ buthas a proportion of gaps which would have been filled with oxygen in thedioxide. This can be achieved by employing oxygen in an insufficientquantity for full oxidation of the undercoat material on the substrate.Our GB patent 2247691 discloses a glass coated with such an incompletelyoxidized underlayer. It is also possible to obtain an appropraiate layerwith the method described in EP 275 662.

Another purpose of the underlayer is also to prevent the diffusion ofalkali metal ion from the glass to the outer layer.

The preferred geometric thickness of the undercoat is in the range 30 to100 nm, most preferably in the range 60 to 75 nm. This is the range inwhich the undercoat tends best to impart to the coating stack a neutraltint in reflection.

In a further embodiment of the invention the coating stack alsocomprises an intermediate layer positioned between the main coatinglayer and the outer reflective layer. This intermediate layer may haveas purpose, the increasing of the luminous reflectance of the coatedsubstrate. In this case, suitable materials for the intermediate layerinclude oxides of aluminum or silicon, which may be used alone or inadmixture. Other intermediate layer may be added in order to impart tothe coated substrate other functions, e.g. low emissivity properties. Inthis case, preferred intermediate layer may comprise SnO2 doped withfluorine.

Preferably, as discussed above, the reflectance (RL) of the coatedsubstrate is at least 14% but not so great as to create glare inreflection. Thus it is preferred that the coated substrate has a maximumreflectance (RL) of 30%, preferably of 25%, most preferably a maximumreflectance of 20%.

It is mostly required that the glazing panel shall transmit a sufficientproportion of visible light in order to allow both good naturalillumination inwards into the building or vehicle and good visibilityoutwards. The light transmittance (TL) of a coated substrate accordingto the invention is preferably greater than 60%, and more preferablygreater than 65%.

It is desirable to increase to a high level the selectivity of thecoating, i.e. the ratio of the transmittance to the solar factor. It ispreferred that the selectivity is greater than 1.00.

The invention includes within its scope a glazing panel comprising acoated transparent substrate as defined herein. The panel may be asingle sheet or alternatively may include two or more substrate sheetsin a multiple-glazed or laminated assembly. In a multiple glazingcomprising two sheets of glass separated by a gas space, it is preferredthat the coating according to the invention be positioned on position 1,which means in contact with the exterior atmosphere. This is inparticular the case when self-cleaning properties are searched for. Itis also possible, in addition to the coating of the invention, toprovide the other faces of the glazing with other coatings. It is inparticular interesting to provide the glazing with a solar screeningcoating on position 2 and/or a low emissivity coating on position 3.

Pyrolytic methods are generally preferred for the application of all thelayers of the coating stack of the invention. However, other depositionmethods may be envisaged such as sputtering type methods. It is alsopossible to deposit the main layer and the possible underlayer bypyrolytic method and then to deposit the outer layer by sputteringmethod.

Coatings produced by pyrolysis are generally advantageous in having agreater mechanical resistance than coatings produced by other methods.The reactant materials to be pyrolysed may be applied to the substrateby chemical vapour deposition (CVD or “vapour pyrolysis”) or as a liquidspray (“liquid pyrolysis”).

Application of a pyrolytic coating to flat glass is best achieved whenthe glass is newly formed, e.g. as it leaves a float glass line. Thisprovides economic benefits in avoiding the need to reheat the glass forthe pyrolytic reactions to take place, and in the quality of thecoating, since the newly formed glass surface is in pristine condition.

Preferably the source of tin for the main layer is selected from SnCl₂,SnCl₄, Sn(CH₃)₂Cl₂, tetramethyl tin or monobutyl trichloro tin (“MBTC”).When the layer is doped with antimony, the source of antimony for themain layer may be selected from SbCl₅, SbCl₃, organo antimony compoundssuch as Sb(OCH₂CH₃)₃, ClSb(OCH₂CH₃)₂, Cl₂SbOCHClCH₃, Cl₂SbOCH₂CHCH₃Cland Cl₂SbOCH₂C(CH₃)₂Cl. The source of any metallic additive for the mainlayer may similarly be a suitable chloride or organo-metallic compoundof the respective metal. When the layer is doped with fluorine, thesource of fluorine may be, for example hydrofluoric acid ortrifluoro-acetic acid (CF₃COOH).

For the outer layer based on TiO₂, the source of titanium may be, forexample, TTIP (titanium tetra-isopropoxide) or TiCl₄.

The sources of reactants for the respective layers are preferably formedinto single starting mixtures for each of the layers, whereby all of thestarting reactants for a given layer are applied simultaneously to thesubstrate.

To form a coating layer by CVD, the respective reactant mixture isapplied, typically through a nozzle, to the substrate in a coatingchamber. Where this mixture comprises chlorides which are liquid atambient temperature, it is vaporised in a heated current of anhydrouscarrier gas such as nitrogen. Vaporisation is facilitated by theatomization of these reagents in the carrier gas. To produce the oxides,the chlorides are brought into the presence of a source of oxygen, forinstance, water vapour.

Methods and devices for forming such a coating are described for examplein French patent No 2348166 or in French patent application No 2648453These methods and devices lead to the formation of particularly strongcoatings with advantageous optical properties.

To form the coating by a spray method, the substrate may be brought intocontact with a spray of droplets containing the respective reactantmaterials. The spray is applied by one or more spray nozzles arranged tofollow a path which provides the coating across the width of the ribbonto be coated.

CVD offers benefits over sprayed liquids in providing coatings ofregular thickness and composition, such uniformity of the coating beingimportant where the product is to cover a large area. A spray coatingalso tends to retain traces of the sprayed droplets and of the path ofthe spray gun. Moreover, the pyrolysis of sprayed liquids is essentiallylimited to the manufacture of oxide coatings, such as SnO₂ and TiO₂. Itis also difficult to make multi-layer coatings using sprayed liquidsbecause every coating deposition produces a significant cooling of thesubstrate. Furthermore, CVD is more economic in terms of raw materials,leading to lower wastage.

However despite such disadvantages of the spray method it isnevertheless convenient and inexpensive to apply and employs simpleequipment. It is thus often adopted, especially for formation of thickcoating layers.

Glazing panels incorporating coated substrates according to theinvention may be manufactured as follows. Each pyrolytic coating stepmay be carried out at a temperature of at least 400° C., ideally from550° C. to 750° C. The coatings can be formed on a sheet of glass whichmoves in a tunnel oven or on a glass ribbon during formation, whilst itis still hot. The coatings can be formed inside the lehr which followsthe glass ribbon forming device or inside the float tank on the top faceof the glass ribbon whilst the latter is floating on a bath of moltentin.

The invention is further described below with reference to the followingnon-limiting examples.

EXAMPLE 1

A coating stack was applied to clear soda-lime float glass of 6 mmthickness at a series of coating stations each located at a position ina float line where the glass was at an elevated temperature. Anundercoat comprising oxides of aluminum and vanadium was first appliedby spraying on to the glass, which at this initial stage was at atemperature in excess of 550° C., a solution in glacial acetic acid of220 g/l aluminum acetylacetonate and 12 g/l vanadium triacetyl-acetonateto form a layer of about 75 nm geometric thickness. Next a main layer,comprising oxides of tin and antimony, was applied by spraying on to theglass, at a temperature of about 550° C., a solution comprising SnCl₂and SbCl₃. The proportions of Sn and Sb gave an Sb/Sn ratio in the layerof 0.05 and the formed layer thickness was 430 nm. Finally an overcoatlayer comprising oxides of tin and titanium was applied by spraying asolution in dimethylformamide comprising tin dibutylacetate and atitanium chelate formed from octylene glycol titanate and acetylacetone.The overcoat contained 60% SnO₂ by volume and 40% TiO₂ by volume and hada geometric thickness of 70 nm.

The thus-coated substrate was placed in a frame to form a glazing panelwith the coating stack facing outwards. The optical properties of thesubstrate were measured from the external side.

The properties of the glazing panel were as shown in the accompanyingTable.

EXAMPLES 2 TO 11

A coating stack was applied to clear soda-lime float glass of 6 mmthickness at a series of coating stations each located at a position ina float chamber where the glass was at an elevated temperature. Anundercoat silicon oxide SiOx was first applied in a coating stationlocated at a position along the float chamber where the glass was at atemperature of about 700° C. The supply line was fed with nitrogen,silane was introduced thereto with a partial pressure of 0.2%, andoxygen was introduced with a partial pressure of 0.36%. A coating ofSiOx, where x was approximately equal to 1.78, was obtained with arefractive index of about 1.69. The layer had a geometric thickness asspecified in the table. Next a main layer, comprising oxides of tin andantimony, was applied by CVD pyrolysis, using a vaporised reactantmixture of MBTC as the source of tin and SbCl₃ as the source ofantimony. A tin/antimony oxide coating layer containing tin and antimonyin an Sb/Sn molar ratio of 0.05 was formed, in a thickness as specifiedin the table.

Finally an overcoat layer comprising oxides of tin and titanium wasapplied by spraying a solution in dimethylformamide comprising tindibutylacetate and a titanium chelate formed from octylene glycoltitanate and acetylacetone. The overcoat contained 60% SnO₂ by volumeand 40% TiO₂ by volume and had a geometric thickness as specified in thetable.

The thus-coated substrate was placed in a frame to form a glazing panelwith the coating stack facing outwards. The optical properties of thesubstrate were measured from the external side.

EXAMPLES 12 TO 19

The procedure of examples 12 to 19 was the same as for examples 2 to 11,except that the overcoat layer was made of pure TiO₂, starting fromtitanium chelate formed from octylene glycol titanate and acetylacetone.In examples 16 to 19, the tin/antimony oxide coating layer contains tinand antimony in a Sb/Sn molar ratio of 0.1.

COMPARATIVE EXAMPLES C.1 TO C.10

A coated substrate was prepared as described in Example 2 to 19 but withthe difference that no overcoat was applied to the main layer. Incomparative examples C1 to C8, the molar ration Sb/Sn in thetin/antimony coating layer was 0.05. In comparative examples C9 and C10,this molar ratio is 0.1. The properties of the so-formed glazing panelare again shown in the accompanying Table.

Comparison of the results shows a significant improvement in theluminous reflectance of the panel, from less than 10% to more than 24%with a pure TiO₂ overcoat. The improvement was accompanied by somereduction in luminous transmittance but this was still within acceptablelimits.

EXAMPLES 20 TO 26

A SiOx undercoat was applied on a float glass of 6 mm thickness by CVD,as explained in examples 2 to 11. Next, a main layer of tin oxide wasdeposited by CVD, using MBTC as the source of tin. Finally, an overcoatof TiO2 was applied by CVD starting from vaporized reactant of TTIP astitanium precursor.

EXAMPLE 27

The same main layer (SnO2) and overcoat layer (TiO₂) as in examples 20to 26 were applied but no undercoat was deposited.

EXAMPLES 28 TO 30

A stack: Glass/SiOx/SnO2:Sb (with molar ratio Sb/Sn=0.05)/TiO2 wasapplied. The two first layers are deposited in the same way as inexamples 2 to 15 and the overcoat layer was deposited as in examples 20to 26.

EXAMPLE 31

A stack of SiOx/SnO2:Sb (with molar ratio Sb/Sn=0.1)/TiO2 was applied.The two first layers are deposited in the same way as in examples 16 to19 and the overcoat layer was deposited as in examples 20 to 26.

EXAMPLE 32 TO 36

The main layer is composed of SnO2 doped with fluorine and is obtainedby CVD starting from MBTC as the source of tin and HF as the source offluorine. A TiO2 overcoat layer was deposited as in examples 20 to 26.In examples 32 to 35 an underlayer of SiOx is applied as explainedhereinabove and in example 36, no underlayer is deposited under the mainlayer.

EXAMPLE 37

The main layer is composed of two layer of SnO2, the first one dopedwith 5% antimony and the second one with fluorine. The undercoat andovercoat are obtained as explained above for examples 20 to 26.

In all examples 12 to 37, the refractive index of the outer layer isaround 2.3 and 2.4.

It is expected that the photocatalytic activity for each stack will varywith the thickness of the outer TiO₂ layer. For thicknesses between 12and 30 nm (examples 12, 14, 16, 18, 20-22, 26, 28, 29, 31-33), thephotocatalytic activity should be around 10.10⁻³ cm⁻¹ min⁻¹ and 15.10⁻³cm⁻¹ min⁻¹. For TiO₂ thickness around 40 nm (examples 13, 15, 17, 19,23, 25), the photocatalytic activity should be around 20.10⁻³ cm⁻¹min⁻¹. For TiO₂ thickness above 100 nm (examples 24, 27, 35 and 36), theexcepted photocatalytic activity is around 35 and 40.10⁻³ cm⁻¹ min⁻¹

The thickness of each layer and the properties of each glazing panel aregathered in the following tables. TABLE 1 Examples 1 2 3 4 5 6 7 8 9 1011 Undercoat thickness (nm) 75 62.5 62.5 67.5 67.5 72.5 62.5 62.5 67.567.5 60 Main layer thickness (nm) 430 342.5 342.5 342.5 342.5 342.5347.5 347.5 347.5 347.5 350 Overcoat thickness (nm) 70 64 68 64 68 62 6468 64 68 69 Luminous reflectance (RL) (%) 21.7 18.4 18.4 18.6 18.6 18.718.4 18.5 18.6 18.6 18.4 Hunter value in reflection a 0.1 0.44 −0.53−0.2 −0.95 −0.3 −0.62 −1.61 −1 −1.8 −2.3 Hunter value in reflection b−2.6 −3.84 −2.3 −3.5 −2.07 −3.9 −3.64 −2.04 −3.42 −1.93 −1.5 Colourpurity in reflection (%) 4.2 6.5 4.6 6.4 4.6 7.1 7 5.1 6.9 5 4.8 λ_(D)in reflection (nm) 488 475 480 478 483 478 480 485 481 486 488 Luminoustransmittance (TL) (%) 42.3 64.8 64.8 64.7 64.7 64.6 64.7 64.65 64.664.5 64.6 Solar factor (FS) (%) 42.6 59 58.8 59 58.9 59.1 58.8 58.6 58.858.7 58.5 Selectivity (TL/FS) 0.99 1.10 1.10 1.10 1.10 1.10 1.10 1.101.10 1.10 1.10 Comparative examples C1 C2 C3 C4 C5 C6 Undercoatthickness (nm) 62.5 67.5 72.5 62.5 67.5 60 Main layer thickness (nm)342.5 342.5 342.5 347.5 347.5 350 Luminous reflectance (RL) (%) 12.712.5 12.3 12.7 12.5 12.8 Hunter value in reflection a −2.4 −1.5 −0.82−1.4 −0.75 −1.2 Hunter value in reflection b 2.3 1.4 0.63 2.2 1.4 2.4Colour purity in reflection (%) 4.8 3 1.2 5 3.3 5.7 λ_(D) in reflection(nm) 559 559 552 567 569 569 Luminous transmittance (TL) (%) 69.9 70.170.2 69.7 69.9 69.6 Solar factor (FS) (%) 65.4 65.4 65.3 65.2 65.2 65.1Selectivity (TL/FS) 1.07 1.07 1.08 1.07 1.07 1.07

TABLE 2 Examples 12 13 14 15 16 17 18 19 Undercoat thickness (nm) 70 7070 70 70 70 70 70 Main layer thickness (nm) 300 291.8 413.6 393.3 313.3292.4 391.2 400 Overcoat thickness (nm) 25.5 40.5 27.1 45.2 21.5 39.128.6 50.1 Luminous reflectance (RL) (%) 19 24.6 18.3 24.4 15.4 22.6 16.724.5 Hunter value in reflection a −1.7 −1.1 −3.1 −3.7 −0.7 −0.9 −1.1−4.0 Hunter value in reflection b −4.6 −3.7 −7.1 −5.3 −4.4 −4.7 −9.7−3.2 Colour purity in reflection (%) 9.3 6.5 14.8 10.7 9.0 8.0 17.7 8.0λ_(D) in reflection (nm) 481.9 481.1 482.4 484.4 479.4 480.0 478.8 487.1Luminous transmittance (TL) (%) 66.7 62.4 63.2 59.1 48.6 46.0 42.2 37.7Solar factor (FS) (%) 61.7 58.8 57.4 54.7 50.6 48.9 45.8 41.8Selectivity (TL/FS) 1.08 1.06 1.10 1.08 0.96 0.94 0.92 0.90 Comparativeexamples C7 C8 C9 C10 Undercoat thickness (nm) 70 70 70 70 Main layerthickness (nm) 300 413.6 313.3 391.2 Luminous reflectance (RL) (%) 9.89.5 9.5 9.2 Hunter value in reflection a −2.9 1.9 −4.1 3.1 Hunter valuein reflection b −2.8 −3.0 −1.4 −2.3 Colour purity in reflection (%) 9.75.7 8.4 6.8 λ_(D) in reflection (nm) 486.1 −566.7 490.7 −550.8 Luminoustransmittance (TL) (%) 74.5 70.2 52.8 46.2 Solar factor (FS) (%) 67.763.2 54.4 49.7 Selectivity (TL/FS) 1.10 1.11 0.97 6.93

TABLE 3 Examples 20 21 22 23 24 25 26 27 Undercoat thickness (nm): SiOx75 75 75 75 65 75 75 0 Main layer thickness (nm): SnO2 85 300 300 290140 85 83 65 Overcoat thickness (nm): TiO2 12 15 20 40 120 40 20 100Luminous reflectance (RL) (%) 14 15.9 17.7 24.9 16.1 22.6 16.2 17.5Hunter value in reflection a −0.4 −2.1 −2.1 −2.0 −2.9 −1.6 −0.7 4.2Hunter value in reflection b −2.9 −3.8 4.0 −3.2 −9.2 −5.5 −4.7 −2.0Colour purity in reflection (%) 6.3 9.1 8.9 6.3 18.9 9.9 9.4 7.5 λ_(D)in reflection (nm) 479.1 483.3 483.1 483.9 481.2 481.1 479.2 489.5Luminous transmittance (TL) (%) 82.8 81.1 79.3 72.4 82.4 74.6 82.3 81.0Solar factor (FS) (%) 73.9 73.1 71.4 64.6 73.6 67.8 73.5 72.3Selectivity (TL/FS) 1.12 1.11 1.11 1.12 1.12 1.10 1.12 1.12

TABLE 4 Examples 28 29 30 31 32 33 34 35 36 37 Undercoat thickness (nm):SiOx 75 75 75 70 75 30 70 75 0 75 Main layer thickness (nm): SnO2:Sb 28085 270 290 0 0 0 0 0 250 Main layer thickness (nm): SnO2:F 0 0 0 0 80 60280 280 75 250 Overcoat thickness (nm): TiO2 12 12 52 15 15 15 40 255300 150 Luminous reflectance (RL) (%) 13.0 12.9 26.8 12.7 14.9 22.7 25.018.6 20.0 20.7 Hunter value in reflection a −1.6 −0.5 −2.1 −2.7 −0.2−2.0 −2.9 −9.6 −1.2 −6.3 Hunter value in reflection b −5.7 −4.4 −1.7−5.7 −3.9 1.8 −3.5 4.9 1.4 −8.7 Colour purity in reflection (%) 13.1 9.74.0 14.3 7.8 2.7 7.58 17.3 2.4 18.7 λ_(D) in reflection (nm) 480.9 478.9487.0 482.7. 478.0 556.5 485.2 489.1 562.2 484.6 Luminous transmittance(TL) (%) 71.7 80.1 60.6 51.6 82 74.5 72.3 78.4 77 66.2 Solar factor (FS)(%) 65.2 71.5 55.1 49.1 75.2 69.6 66.3 71.9 70.6 61.3 Selectivity(TL/FS) 1.10 1.12 1.10 1.05 1.09 1.07 1.09 1.09 1.09 1.08

1-26. (canceled)
 27. A transparent substrate carrying a coating stack,the coating stack comprising, in order from the substrate: an undercoatlayer, a pyrolytically-formed main coating layer comprising oxide oftin, and an outer reflective layer which has a refractive index rangingfrom 2.0 to 2.8, so that the coated transparent substrate has areflectance (RL) of more than 10%.
 28. The coated transparent substrateas claimed in claim 1, wherein the main coating layer has a geometricthickness of at least 250 nm.
 29. The coated transparent substrate asclaimed in claim 1, wherein the outer reflective layer has a geometricthickness ranging from 30 to 150 nm.
 30. The coated transparentsubstrate as claimed in claim 1, wherein the outer reflective layercontains at least one oxide selected from the group consisting ofnickel, tin, titanium, zinc, and zirconium.
 31. The coated transparentsubstrate as claimed in claim 1, wherein the outer reflective layercomprises titanium oxide.
 32. The coated transparent substrate asclaimed in claim 1, wherein the outer reflective layer comprisestitanium oxide and tin oxide.
 33. The coated transparent substrate asclaimed in claim 1, wherein the main coating layer further comprisesantimony.
 34. The coated transparent substrate as claimed in claim 1,wherein the main coating layer further comprises antimony and anadditive which is at least one element selected from the groupconsisting of aluminum, chromium, cobalt, iron, manganese, magnesium,nickel, titanium, vanadium, zinc, and zircomum.
 35. The coatedtransparent substrate as claimed in claim 1, wherein the undercoat layerimparts to the coated transparent substrate a more neutral tint inreflection.
 36. The coated transparent substrate as claimed in claim 1,wherein the undercoat layer comprises at least one oxide of silicon. 37.The coated transparent substrate as claimed in claim 1, wherein theundercoat layer comprises alumina.
 38. The coated transparent substrateas claimed in claim 1, wherein the undercoat layer has a geometricthickness which ranges from 60 to 75 nm.
 39. The coated transparentsubstrate as claimed in claim 1, wherein the coating stack furthercomprises an intermediate layer positioned between the main coatinglayer and the outer reflective layer.
 40. The coated transparentsubstrate as claimed in claim 13, wherein the intermediate layercomprises one of aluminum oxide or silicon oxide.
 41. The coatedtransparent substrate as claimed in claim 1, having a luminoustransmittance (TL) of at least 60%.
 42. The coated transparent substrateas claimed in claim 1, having a reflectance (RL) of at least 15%. 43.The coated transparent substrate as claimed in claim 1, having aselectivity (TL/FS) greater than 1.00.
 44. The coated transparentsubstrate as claimed in claim 1, having a colour in reflection definedby a Hunter value a between 0 and −4.0.
 45. The coated transparentsubstrate as claimed in claim 1, having a colour in reflection definedby a Hunter value b between −5.3 and −1.5.
 46. The coated transparentsubstrate as claimed in claim 1, having a colour in reflection definedby a Hunter value a between 0 and −2 and a Hunter value b between −4 and−2.
 47. The coated transparent substrate as claimed in claim 1, having apurity in reflection of not greater than 14.8%.
 48. The coatedtransparent substrate as claimed in claim 1, having a purity inreflection of less than 10%.
 49. A glazing panel, comprising a coatedtransparent substrate as claimed in claim
 1. 50. The glazing panel asclaimed in claim 23, which has a structure of a glazing panel for abuilding.
 51. The glazing panel as claimed in claim 23, which has astructure of a window for a vehicle.
 52. A transparent substratecarrying a coating stack, the coating stack comprising, in order fromthe substrate: an undercoat layer imparting to the coated transparentsubstrate a more neutral tint in reflection, a pyrolytically-formed maincoating layer comprising oxide of tin, and an outer reflective layerhaving a geometric thickness ranging from 30 to 150 nm and a refractiveindex ranging from 2.0 to 2.8, so that the coated transparent substratehas a reflectance (RL) of more than 10%.
 53. The coated transparentsubstrate as claimed in claim 26, wherein the outer reflective layerconsists essentially of titanium oxide.
 54. The coated transparentsubstrate as claimed in claim 27, having a colour in reflection definedby a Hunter value a between 0 and −3.7 and a Hunter value b between −5.3and −2 and having a purity in reflection not greater than 10.7%.
 55. Atransparent substrate carrying a coating stack, the coating stackcomprising, in order from the substrate: an undercoat layer, apyrolytically-formed main coating layer comprising oxide of tin, and anouter reflective layer having a geometric thickness ranging from 30 to150 nm and a refractive index ranging from 2.0 to 2.8, so that thecoated transparent substrate has a reflectance (RL) of more than 10%,has a colour in reflection defined by a Hunter value a between 0 and−3.7 and a Hunter value b between −5.3 and −2 and has a purity inreflection not greater than 10.7%.
 56. The coated transparent substrateas claimed in claim 29, wherein the outer reflective layer consistsessentially of titanium oxide.